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PRODUCT & SERVICE

Electron Beam Lithography

The best model for production of DFB-Laser diode as optical communication devices, with high resolution & throughput.

Electron Beam Lithography

Feature

  • Grating Pitch Control Technology
  • Self environment control – Thermal & noise free
  • Not necessary to prepare for high Cost of Clean Room.
  • Large Field Exposure Technology
  • Low cost management

Specification

Item Description
Emitter TFE (ZrO/W)
Acceleration Voltage 5 to 50kV
Work piece size Max Ø8inch
Min. Beam diameter 2.0nm (for Academic and R&D) / 4.0nm (for Production)
Field size sq. 30μm – sq. 1500μm

※For detailed specifications, please contact us

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